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We would like to introduce the "Titanium Dioxide Crystal Film" handled by NAZCA Corporation. Titanium dioxide film formation occurs at a speed of 7nm/second. Since it is formed through a chemical reaction, there are no inconsistencies, and the thickness can be adjusted to be either thin or thick depending on the reaction time. Additionally, unlike traditional sol-gel film formation methods, it is virtually impossible for the film to peel off. By simply immersing it in a solution tank, a high-purity, high-crystallinity, and high-quality titanium dioxide film can be formed. 【Features of Titanium Dioxide Film Formation】 ■ Film formation at a speed of 7nm/second ■ No inconsistencies due to chemical reaction; thickness can be adjusted to be thin or thick based on reaction time ■ Unlike traditional sol-gel methods, it does not peel off ■ High-purity, high-crystallinity, and high-quality film can be formed just by immersion in a solution tank *For more details, please refer to the PDF document or feel free to contact us.
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Free membership registration"CS1" is a fluorine film formation that allows the substrate to generate fluorine crystals on its surface by soaking a special solution or wiping the substrate with a sheet. The film formation through self-organization is highly durable due to the bonding from chemical reactions. Additionally, a barrier can be created at the atomic and molecular level, enabling anyone to easily form a uniform fluorine film. 【Features】 ■ Resistant to dirt ■ Easy to clean ■ Quick and easy fluorine film formation ■ Almost no impact on the operability of touch panels *For more details, please download the PDF or feel free to contact us.
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