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Solvent-free with a viscosity of approximately 3000 mPa·s (25°C), suitable for thick applications. nD1.69, high refractive index. Suitable for WLO, MLA, AR/MR waveguides, and metamaterials.
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Free membership registrationNK Optimizer Series This is a photo-curable resin for nanoimprinting that applies the technology cultivated in the development and design of resist materials and optical materials. It is a photo-curable resin for nanoimprinting that can be used in sensing devices such as micro-lens arrays (MLA), diffractive optical elements (DOE), facial recognition devices, and mechless LiDAR, as well as AR/VR glasses. The "NL-S Series" offers high heat resistance and solder reflow grade. It provides materials that can be imprinted with a refractive index ranging from low (nD1.35) to high (nD1.93). The "NL-N Series" is a refractive index adjustment material for optical components. The "NL-R1020" is a dry etching resistant grade essential for fine processing, with a selectivity of 1.0 (Al2O3) and 0.6 (TiO2) demonstrated. Various customizations are available to meet customer requirements. *For more details, please refer to the PDF materials or feel free to contact us.
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