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"Photo mask film" is a black-and-white silver halide film that is exposed and developed using a laser light source. There is almost no gray area at the edges of the drawn pattern, allowing for very sharp expression. It is used as a tool for exposing photoresist when forming fine patterns such as MEMS. [Features] - The transparent areas allow light to pass through, while the black areas block light. - There is almost no gray area at the edges of the drawn pattern. *For more details, please refer to the PDF document or feel free to contact us.
