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The "Balance Stage" is a new type of two-axis tilt stage that allows for positioning within 2μm across the entire range of 0 to 360° for high-load objects. With an API and PC program designed to enhance user convenience, the set values are automatically calculated just by inputting the measurement values, making it easy for beginners to operate. Additionally, it employs a fully supported structure that minimizes stress generation, fundamentally preventing deformation of coupling components. 【Features】 ■ High-precision automatic angle adjustment ■ Remote angle control capability ■ Robust design suitable for special environments ■ Angle setting via user-friendly app ■ Real-time adjustment functionality with various sensors ■ High flexibility compatible with various input devices *For more details, please download the PDF or feel free to contact us.
The "Ceria Slurry" used in semiconductor CMP processes is a suspension made by mixing particles of 80 to 300 nm with ultra-pure water and chemicals. It serves the role of polishing the film quality of the target material both scientifically and mechanically. Additionally, the "Additive" used together with the Ceria Slurry during polishing enables selective polishing required in semiconductor processes, depending on the film quality. 【Features】 ■ Excellent stability of the slurry at low and high temperatures ■ Minimal particle agglomeration ■ Superior usability when mixed with additives ■ High polishing rate ■ Excellent control capabilities for defects, scratches, and dishing *For more details, please refer to the PDF document or feel free to contact us.
