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The "AP-T" is a spot-type atmospheric pressure plasma device capable of high-speed processing with ultra-high-density plasma at 2.45GHz. It can also process with clean dry air (CDA), and the plasma stabilizes in less than one second after switching on. The power supply, control, and gas units are integrated, making it easy to install anywhere with simple requirements for power and CDA. 【Features】 ■ High process capability ■ Low running costs ■ Compact design, lightweight ■ Localized processing possible ■ Processing width: up to 10mm ■ Utilities: power supply, gas (Air), exhaust *For more details, please refer to the PDF document or feel free to contact us.
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Free membership registrationThe "Small Experimental Device Type" is an atmospheric pressure plasma device that supports sheet processing up to A4 size. Both remote processing and direct processing are available. It is a semi-automatic type specialized for experimental purposes and easy to handle. It can be used for improving the wettability of small substrates, enhancing adhesion, and surface modification. 【Features】 ■ Compact device ■ Supports various treatments ■ Specialized for experimental purposes ■ Compatible size: up to A4 (for sizes larger than A4, please consult separately) ■ Utility: power supply, processing gas (N2, CDA), exhaust, cooling water *For more details, please refer to the PDF document or feel free to contact us.
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Free membership registrationThe "RD" is a roll-direct plasma device for film surface treatment that is easy to install on existing manufacturing lines. It achieves high uniformity and damage-free film (no particle generation). It has a proven track record at speeds of over 100m/min. Additionally, there is a rich lineup of options available in 1-head or 3-head types. 【Features】 ■ Glow discharge treatment ■ High processing performance ■ Atmospheric pressure process that does not require a vacuum ■ Compatible width: up to 2500mm ■ Processing speed: up to 100m/min ■ Utilities: power supply, processing gas (N2, CDA), exhaust, cooling water *For more details, please refer to the PDF document or feel free to contact us.
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Free membership registrationThe "RT" is an atmospheric pressure remote plasma device with low-temperature processing and electric field shielding structure. It achieves processing at high speed (10m/min) below 10° (for processing glass substrates for LCDs). We offer a wide range of options accommodating widths from 160 to 3400mm. In the LCD field, it is used for improving the wettability of glass surfaces and enhancing wet cleaning effects. In the touch panel and OLED fields, it is used for surface modification of conductive films and pre-treatment for lamination. 【Features】 ■ Damage-free ■ High processing performance ■ Wide range of options ■ Numerous proven results ■ Supported widths: 160 to 3400mm ■ Utilities: power supply, processing gases (N2, CDA), exhaust, cooling water *For more details, please refer to the PDF document or feel free to contact us.
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