Sputtering achieves excellent adhesion even at low temperatures. We provide sputtering film deposition at low cost and with short delivery times.
Sputtering is classified as a dry plating method, allowing for plating treatment without exposing the object to be coated to liquids or high-temperature gases. As a result, it is used for various substrate materials (resin, glass, ceramics, and others) in sheet and molded products, for example, as electrodes, shields, and masking. 【Features】 - It is possible to process and form different metals as an "alloy" on the same target. - Clean surface treatment processing. *For more details, please contact us.
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basic information
We will perform film deposition at low cost and with a short lead time during the research and development stage. We possess large sputtering equipment and can deposit films on relatively large substrates. Based on our know-how in sputtering thin film surface treatment, we will provide various proposals. We are collaborating with public research institutions to develop sputtering deposition technology. We accept various inquiries related to sputtering deposition, from mass production to prototype production in the research and development stage, as well as small lot production. We offer contract processing and film deposition services.
Price information
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Delivery Time
P4
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Applications/Examples of results
ITO transparent conductive film, Cu alloy EMI electromagnetic wave shielding film, Ti, Cr, SUS, Ni, Ni-Cr, Nb, Ag films, SiO, CrO, TiO, TiN, TiC, AlO reactive films, others.
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Company information
- We will create thin film prototypes at a low cost and with a short delivery time during the research and development stage. - Based on our know-how in sputtering thin film surface treatment, we will provide various proposals. - We are collaborating with public research institutions to develop sputtering deposition technology.