Infrared radiation can be precisely applied to samples in various atmospheres, such as high vacuum or gas flow, allowing for rapid heating without contact.
- The ultra-fast heating GVL298 can reach 1500°C in one minute. - Infrared is introduced into the vacuum chamber from the ICF70 flange of the vacuum system, heating only the sample.
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basic information
Rapid Heating: Maximum heating rate of 150°C/sec, reaching 1500°C in about 1 minute Clean Heating: No concerns about gas generation from the heat source or electromagnetic induction Localized Heating: Infrared is irradiated only on the sample, without heating the surroundings Flexible Installation: Can be installed on various systems
Price information
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Delivery Time
※2.5 months
Applications/Examples of results
Rapid heating and annealing of samples such as Si and SiC Formation of oxide crystals and thin film creation in an oxidizing atmosphere Heating of substrates in hydrogen and nitrogen Heating of samples under X-ray or ultraviolet irradiation Heating of samples in desorption gas analysis equipment, XPS, XRD, PLD, etc. Heating in a magnetic field and heating in a non-magnetic field Heating under pressurized atmosphere Heating with a load applied to the sample
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In 1982, we established our company with the theme of "Heat." Since then, we have been advancing the development and sales of heat treatment equipment for research and development, utilizing unique heat treatment technologies that are not found in other companies, which are essential for the research and development of new materials. In particular, our infrared heating device has gained significant attention as a "new heating method" for test samples in ultra-high vacuum systems, and it is widely used in universities of science and engineering across the country, independent administrative research institutes, private research and development departments, and overseas universities. Currently, we have delivered over 700 units of this device and more than 3,000 units of various heat treatment equipment in total.