Development of new functional films and development of next-generation surface protective films.
Achieve high-quality films that cannot be obtained with sputtering or plasma CVD! With the combination of SPS equipment (electric current sintering device), flexible thin film development becomes possible! From target production to film deposition experiments, all can be completed in one day! Real ion plating using clean vacuum arc plasma.
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basic information
Production Filtered Arc Deposition Device Small-scale Filtered Arc Deposition Device for Development: μT-FAD Capable of forming ta-C films, hydrogen-free DLC, and various other DLCs Compatible with metal films, alloy films, nitrides, oxides, and other compound films Droplet-free, ultra-smooth film formation, ultra-thin film formation
Price information
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Delivery Time
※10 months after the order is received
Applications/Examples of results
Development of release films for glass lens molding molds Development of thin films for cutting tools for aluminum alloys and difficult-to-cut materials
Company information
In the 21st century, where IT transformation is accelerating and more advanced technologies are required in society and industry, expectations for gas are increasingly expanding. From bulk gases that are essential in production environments to ultra-high purity gases required for semiconductors and liquid crystals, we provide a diverse range of gas resources that are indispensable at every stage of the production process, ensuring stability and safety, and establishing a comprehensive sales and supply system that supports industrial development.
![[Uncoated Inner Standard] Buffer Tank <Main Material: SS400>](https://image.mono.ipros.com/public/product/image/c3c/2001482233/IPROS17323975474794643140.jpeg?w=280&h=280)
