Please consult us regarding the ion beam etching treatment of the polished surface.
If you specify the element dimensions, phase integration angle, or conversion wavelength, we will manufacture the element according to your requirements.
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basic information
【Specifications】 ○Dimensions: 5×5×10 mm (193 nm, 213 nm, 266 nm) / 5×5×15 mm (266 nm) ○Phase matching angle tolerance: ⊿φ±0.5 degrees, ⊿θ±0.2 degrees ○Flatness: λ/8 or less, λ=633 nm ○Transmitted wavefront: λ/4 or less, λ=633 nm ○Parallelism: 30 seconds or less ○Surface roughness: 6 Å or less (rms) ○Scratch-Dig: 10-5 (MIL-O-13830-A) ○Effective diameter: Center φ3.5 ○Anti-reflective coating: None ○Our company has obtained a license for patent number 2812427 (National Institute of Advanced Industrial Science and Technology, Professor Sasaki of Osaka University). ●For more details, please contact us or refer to the catalog.
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Company information
Our company launched the "Second 3D (Dynamic, Drastic, Dream) Plan" in April 2008, and we are striving towards the vision outlined below to meet our customers' expectations. We aim to maintain overwhelming superiority in crystal processing technology and become a top company with a very high market share in such niche markets. We will enhance customer satisfaction, generate sufficient profits for employee satisfaction, and fulfill our social corporate responsibilities in areas such as ethics, human rights, and the environment. We aspire to become a company capable of rapid responses and building technological capabilities that generate profits.