Applicable not only to glass substrates but also to polyimide resin and device end faces.
We provide filters with low loss, flat transmission characteristics, and steeper rise times using our unique plasma ion process, ensuring high quality and reliability. We can accommodate your requirements regarding center wavelength, separation wavelength, branching ratio, incident angle, and more.
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basic information
【Features】 ◯ Applicable not only to glass substrates but also to polyimide resin and element end faces ◯ Our unique plasma ion process ◯ Generates filters with low loss, flat transmission characteristics, and steeper rise times ◯ Responds to user requirements such as center wavelength, separation wavelength, branching ratio, and incident angle ● For more details, please contact us.
Price information
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Delivery Time
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Applications/Examples of results
DWDM (Add, Drop MUX/DeMUX) Noise reduction for light sources Improvement of crosstalk in AWG High-speed broadband PON system Others
Company information
Since its establishment in 1946, Nippon Vacuum Optics has been striving to improve optical thin film technology and has consistently pioneered cutting-edge technologies, including the establishment of high-frequency plasma and ion process technologies. The products created through its exceptional technical capabilities and reliable quality management system have gained high reliability across a wide range of fields, from home appliances to information and communication, biotechnology, and space development. Thus, the application areas of optical thin film technology are vast and limitless. As a "problem-solving company" proposing new possibilities for technology, we continue to respond to various themes faced by our customers and pursue customer satisfaction.
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