We provide products that are optimal for our customers' usage environments and purposes, compatible with substrate sizes from 1" to 6", as well as III-V and II-VI materials.
We consistently manufacture everything in-house, from major components such as molecular beam cells, RHEED, BFM, and substrate heating mechanisms to control units like chambers, shrouds, process controllers, and shutter controllers.
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basic information
【Features】 ○ Utilizes ARIOS's ultra-high vacuum technology, enabling film formation in a clean vacuum. ○ Major components such as molecular beam cells and substrate rotation heating mechanisms undergo heating and degassing treatment. ○ A wide range of options is available, including RHEED, BFM, and radical sources. ○ Exhaust operations and process operations can be automated via a touch panel and sequencer. ○ Transport can accommodate trolley transport and transfer transport, with the option for automatic transport as well. ● For more details, please contact us or refer to the catalog.
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Company information
In 1972, the first president, Horita, established Taisei Sangyo Co., Ltd. using the entrance of his home as a workplace, and since then, we have been dedicated to technology development and research. Initially, we were involved in the development of devices such as the Polack counter for the Meteorological Research Institute, starting our work in the field of atmospheric science. Subsequently, we expanded our work into the vacuum world by starting maintenance services for leak detectors. Around the 10th anniversary of our founding, work in ultra-high vacuum began to increase, and by the 15th anniversary, we were able to manufacture small devices. Currently, our scope of work has significantly expanded, not only covering ultra-high vacuum, MBE, CVD, ECR, and RF radical sources, but also advancing the development of functional components utilizing various plasmas, ions, or electrons. In the future, we aim to become a small enterprise that can truly compete in the world of cutting-edge technology.
