Various raw gases can be processed using ICP-type RF high-density plasma, which can be utilized for film formation experiments, etching experiments, and more.
The plasma chamber is made of quartz, and it enables a process with minimal metal contamination due to the use of non-electrode discharge. It can operate stably for long periods even during the introduction of active gases, and it can produce clean atomic and radical beams.
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【Features】 ○ The viewing port allows for visual confirmation of discharge. Additionally, high-precision plasma spectroscopy is possible. ○ The automatic matching mechanism enables easy operation and stable performance over long periods. ○ It is air-cooled, eliminating concerns about cooling water, and can be easily installed on existing equipment. ○ Spectral data of nitrogen radical atoms is available, allowing it to be used as a nitrogen radical source. ● For more details, please contact us or refer to the catalog.
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Company information
In 1972, the first president, Horita, established Taisei Sangyo Co., Ltd. using the entrance of his home as a workplace, and since then, we have been dedicated to technology development and research. Initially, we were involved in the development of devices such as the Polack counter for the Meteorological Research Institute, starting our work in the field of atmospheric science. Subsequently, we expanded our work into the vacuum world by starting maintenance services for leak detectors. Around the 10th anniversary of our founding, work in ultra-high vacuum began to increase, and by the 15th anniversary, we were able to manufacture small devices. Currently, our scope of work has significantly expanded, not only covering ultra-high vacuum, MBE, CVD, ECR, and RF radical sources, but also advancing the development of functional components utilizing various plasmas, ions, or electrons. In the future, we aim to become a small enterprise that can truly compete in the world of cutting-edge technology.