Virtual Lithography Simulator
The lithography simulator expresses the imaging by the exposure optical system and the process of photoresist exposure and development through numerical calculations on a computer, and calculates the shape of the photoresist after development. It has become an indispensable tool for research, development, and manufacturing in lithography.
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basic information
【Features】 ○ Supports multi-point CD measurement (oblique measurement possible) ○ Compatible with liquid immersion lithography technology ○ Equipped with a probabilistic model ○ Supports 3D masks ● For more details, please contact us or refer to the catalog.
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Applications/Examples of results
For more details, please contact Risotech Japan.
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Company information
Riso Tech Japan, since its establishment, has been a specialist in lithography, providing not only resist exposure/development analysis equipment, resist coaters/developers, and lithography simulators, but also evaluation of exposure/development materials for cutting-edge lithography processes. In particular, for resist processing equipment, we propose optimal specifications tailored to customer needs, adapting spin coaters, developers, bake (PEB) equipment, and film thickness measurement to various fields, ranging from development experimental equipment to fully automated production systems. For example, we offer coating equipment for various substrates such as ultra-thin silicon wafers, various compound semiconductors, quartz, sapphire, and piezoelectric substrates (SAW), including ArF resist, EB resist, high-viscosity thick-film resist, polyimide, insulating films, and wax, as well as development equipment for alkaline, inorganic, and organic materials. Additionally, we provide various process units such as HMDS treatment, vacuum bake, UV irradiation, and high-temperature bake processing.
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