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  6. Contamination (residual foreign matter) measuring device MGF-2000ci/2000ciT

Contamination (residual foreign matter) measuring device MGF-2000ci/2000ciT

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last updated:Oct 11, 2021

森合精機 装置事業部
森合精機 装置事業部
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With easy operation, high-precision and accurate contamination measurement can be performed in a short time.

The cleaning machine manufacturing technology that Mori-Ai Seiki has cultivated so far is utilized not only in cleaning machines but also in measuring devices for the cleanliness of workpieces. Our contamination (residual foreign matter) measuring device brings strict standards and efficiency to the residual foreign matter checks that have relied on the intuition and experience of the measurer through computer algorithms and programming. The standard model "MGF-2000ci" allows for high-precision measurement of contamination (residual foreign matter) using a simple operation, which previously required skilled methods. Anyone can perform high-precision and accurate contamination measurements in a short time. Additionally, the "MGF-2000ci-T" is a measuring device that adds a measurement function for the height (thickness) of contamination that cannot be measured by the standard model. The minimum measurable height size is up to 10μm. For more details, please contact us.

    Other measurement, recording and measuring instruments
14img_contami.jpg

Contamination (residual foreign matter) measuring device MGF-2000ci/2000ciT

14img_contami.jpg
14img_contami.jpg
  • Related Link - https://www.morigoseiki.co.jp/grafiner/

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【Features】 [MGF-2000ci] ○ High-precision measurements can be made with simple operations following screen instructions. ○ Anyone can perform high-precision and accurate contamination measurements in a short time. ○ Data can be easily saved to a computer, significantly reducing measurement time. ○ An interactive "MAN-MACHINE" interface is adopted for monitor screen display and operator operation. ○ Contaminants are classified into four categories: dimensions, area, weight, and quantity, allowing for highly accurate aggregation. ○ Minimum measurable contamination (residual foreign matter) → Minimum readable size: 0.005mm → Minimum readable weight: 0.1mg [MGF-2000ci-T] ○ A measuring device with an added function for measuring the height (thickness) of contaminants that cannot be measured with the standard model. ○ The minimum readable size for height is up to 10μm. ○ Minimum measurable contamination (residual foreign matter) → Minimum readable length: 0.005mm → Minimum readable height (thickness): 0.01mm → Minimum readable weight: 0.1mg ● For more details, please contact us.

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森合精機

森合精機 装置事業部

Industrial Machinery

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【Cleaning Performance Created by Hydraulic Equipment Manufacturing】 Since our establishment in 1964, we have been engaged in hydraulic equipment manufacturing for many years. High-performance cleaning machines are essential for thoroughly cleaning chips and oil from hydraulic parts, which require precision that can withstand long-term use. The voices of customers seeking high quality from such hydraulic parts and from the field have simultaneously enhanced the performance of cleaning machines. 【Adaptability through Standard Machine Customization】 We offer a lineup of high-functionality and versatile standard machines. These standard machines can be customized according to the size of the cleaning work and the required cleaning precision. This makes maintenance, such as parts replacement, easy. Additionally, by customizing to user specifications, various benefits arise, including quick integration into production lines and stable operability. 【High Performance Realized by Original Standards】 Having manufactured various cleaning machines, we leverage our technical expertise and experience to develop cleaning machines and peripheral equipment based on original standards. Furthermore, by collaborating with professionals from other industries, we are continuously improving technology and developing high-performance equipment. We capture the diverse needs in cleaning and deliver customer satisfaction.

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