Ideal for ultra-thin film production in UHV environments. Product from Oxford Alraide Research, UK.
Advanced control is possible, allowing for a range of 0.1 to 50 Å/min for many materials. ≪Applications≫ Fabrication of thin films in the nanometer range, semiconductor doping ≪Features≫ ■ Design that is free from contamination with high cooling efficiency ■ Choice of materials in rod or crucible form ■ Precise film thickness control enabled by the standard flux monitoring plate ■ Available in single pocket and four pocket types; the four pocket type allows for independent control of each pocket and simultaneous deposition of up to four materials.
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basic information
There are types with 1 pocket and 4 pockets, and the 4-pocket type includes options for independent control of each pocket and the ability to simultaneously deposit up to four different materials.
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