Ideal for ultra-thin film production in UHV environments. Product from Oxford Alraide Research, UK.
Advanced control is possible, allowing for a range of 0.1 to 50 Å/min for many materials. ≪Applications≫ Fabrication of thin films in the nanometer range, semiconductor doping ≪Features≫ ■ Design that is free from contamination with high cooling efficiency ■ Choice of materials in rod or crucible form ■ Precise film thickness control enabled by the standard flux monitoring plate ■ Available in single pocket and four pocket types; the four pocket type allows for independent control of each pocket and simultaneous deposition of up to four materials.
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basic information
There are types with 1 pocket and 4 pockets, and the 4-pocket type includes options for independent control of each pocket and the ability to simultaneously deposit up to four different materials.
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Vacuum Part Vacuum pump, vacuum gauge, vacuum valve, metal bellows, various flanges, current feedthroughs Vacuum Unit Development, design, manufacturing, modification, repair, and maintenance of vacuum equipment Vacuum Processing Vacuum chamber, exhaust piping, special precision machining We are a total provider of vacuum solutions!
