High resolution, low cost, high throughput nanoimprint lithography.
The ImpFlex Essential, a simplified UV nanoimprint lithography device, is attracting attention as a next-generation microfabrication technology due to its high miniaturization, low cost, and high throughput compared to conventional photolithography. This device is a low-cost model that has undergone thorough cost reduction based on the higher-end model, Impflex. Despite its low price, the imprint engine inherits features that achieve low residual film and uniform film thickness. Mold materials such as quartz and Ni electroforming, among others, are available as options. This experimental device can be used in various fields, including optical devices, MEMS (NEMS), optical communication devices, diffraction gratings, microlenses, microfluidic devices, and biochips for DNA analysis. For more details, please contact us or refer to the catalog.
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【Features】 ○ Equipped with an imprint engine common to Impflex, which has low residual film and high uniformity of residual film thickness. ○ Achieves low prices through thorough cost reduction. ○ Upgradeable from a minimal configuration to a rich array of options. ○ Compatible with various molds. → Other materials such as quartz and Ni electroforming can also be used as options. ○ UV irradiation using UV-LED light source. ○ Supports bubble elimination gas process. ○ Compared to conventional photolithography, offers high miniaturization, low cost, and high throughput. ○ Experimental equipment usable in various fields. → Optical devices, MEMS (NEMS), optical communication devices, diffraction gratings. → Micro lenses, microfluidic devices, biochips for DNA analysis, etc. 【Specifications Overview】 ○ Compatible wafer size: Up to 6 inches. ○ Imprint weight: Up to 1000N. ○ Mold size: 10mm to 90mm. ○ Imprint sequence: Step & repeat. ○ XY stage: Manual slide type. ○ Alignment microscope: Optional. ○ UV curing resin: Applied using an atmospheric spin coater. ● For more details, please contact us or refer to the catalog.
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