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  6. Optimal for epitaxial growth: oxide substrates for thin film growth

Optimal for epitaxial growth: oxide substrates for thin film growth

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last updated:Jun 13, 2024

信光社
信光社
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Consistent production from crystal growth to processing in-house. High-quality crystal substrate surfaces without processing distortion.

【Optimal for Epitaxial Growth】 Oxide substrates for thin film growth have been contributing to advancements in science and technology since the 1980s, providing substrates such as SrTiO3 and sapphire for high-temperature superconducting thin films and GaN. For epitaxial growth substrates, the crystal quality, surface smoothness, flatness, and the presence or absence of crystal lattice strain at the very surface are crucial. Our company has achieved consistent in-house production from crystal growth to processing through years of technological accumulation. With our high-precision processing technology, we continue to provide high-quality crystal substrate surfaces. We always keep standard specifications in stock and deliver them within approximately 10 days after order placement. We also offer custom-made options for surface orientation, shape, and off-angle according to your needs, so we handle products with specifications not listed in our lineup. Please feel free to contact us. *For more details, please inquire or refer to our catalog.*

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Optimal for epitaxial growth: oxide substrates for thin film growth

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【Features】 ○ Oxide single crystal STEP substrate (available as an option for some specifications) → Conducts our unique step treatment optimal for high-quality epitaxial growth → Guarantees step & terrace, providing a high-quality surface finish with excellent flatness → AFM images of all substrates are attached upon shipment ○ Sapphire (α-Al2O3) substrate → Uses in-house produced sapphire single crystals with very few crystal defects → High-quality surface suitable for epitaxial growth ○ SrTiO3 (Strontium Titanate) substrate → Uses in-house produced high-quality, high-purity single crystals → High-quality surface suitable for epitaxial growth → Crystals doped with Nb to impart conductivity are also standard → Compatible with STEP substrates ○ TiO2 (Rutile) substrate → Uses in-house produced high-quality, high-purity single crystals → High-quality surface suitable for epitaxial growth → Crystals doped with Nb to impart conductivity are also standard → Compatible with STEP substrates ○ NdGaO3 (Neodymium Gallate) substrate → Uses in-house produced high-quality, high-purity single crystals → High-quality surface suitable for epitaxial growth

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Optimal for epitaxial growth: oxide substrates for thin film growth.

Optimal for epitaxial growth: oxide substrates for thin film growth.

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信光社

信光社

Ceramics

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Our company is a manufacturer of oxide single crystals. In particular, we specialize in the following products: 1. Sapphire (α-Al2O3) 2. SrTiO3 3. Rutile (single crystal of TiO2). Although we are a crystal manufacturer, we also perform a full range of processing, including cutting, grinding, and polishing. Having handled crystals for over 70 years since our founding, we possess extensive knowledge and experience, especially regarding sapphire. Recently, we have also been mass-producing sapphire crystals larger than 300mm, allowing us to accommodate large-shaped products and mass production. We are a small company with about 170 employees, but please feel free to contact us if there is anything we can assist you with.

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