This is the world's first ultra-compact radical absolute density measurement device that can be used in processes.
The Radimo Radical Monitor <Opposing Type Radical Monitor DP Type> is a monitoring device that measures atomic radicals in the gas phase generated during etching, surface treatment, and thin film production, enabling feedback into the process. It is the world's first ultra-compact radical absolute density measurement device that can be used in processes. It measures atoms present in the ground state in plasma using absorption spectroscopy, allowing for the selection of the optimal structure based on the measurement target and purpose. The measurement software is equipped with the latest calibration results from research conducted at Nagoya University’s Hori Laboratory. For more details, please contact us or refer to the catalog.
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【Features】 ○ Measurement of atomic radicals in the gas phase generated during etching, surface treatment, and thin film production ○ Monitoring device that enables feedback to the process ○ World's first ultra-compact radical absolute density measurement device usable in processes ○ Direct measurement of atomic radicals of hydrogen, nitrogen, and oxygen using vacuum ultraviolet absorption spectroscopy, allowing feedback to the process ○ Can be mounted on ICF70 flanges ○ Compatible with various plasma devices → EBEP treatment devices, CCP etching/CVD, Cat-CVD, ICP etching/CVD, etc. ○ System configurations such as vacuum exhaust system integrated control monitoring systems can be tailored to customer needs ● For more details, please contact us or refer to the catalog.
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