We would like to introduce a device for drying and curing film at high temperatures.
The "IR Oven Film ME-9001" is a device for drying and curing film at high temperatures. The process consists of two IR sections and one cooling section. The device dimensions are L9220×W1500×H1300mm, weight = 2600kg, and the work dimensions are L390×W500mm×t0.12–0.188mm and L370×W470mm×t0.4–0.7mm. The tact time is 20 seconds per glass. For more details, please contact us or refer to the catalog.
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【Specifications】 ○ A device for drying and curing film at high temperatures ○ The process consists of two IR sections and one cooling section ○ Device dimensions: L9200×W1500×H1300mm, Weight=2600kg ○ Workpiece dimensions: → L390×W500mm×t0.12～0.188mm → L370×W470mm×t0.4～0.7mm ○ Process: IR Chamber 1 → IR Chamber 2 → Cooling section ○ Tact time: 20 seconds/1 glass ● For more details, please contact us or refer to the catalog.
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Company information
July 2009: Received certification for a research and development plan related to the advancement of manufacturing infrastructure technology for small and medium-sized enterprises from the Ministry of Economy, Trade and Industry. June 2010: Began joint development with the National Institute of Advanced Industrial Science and Technology on glass etching for solar cells. February 2011: Ordered and received an 8-inch chemical cleaning system for the 3D semiconductor research center. July 2011: Contracted by Saitama Prefecture for the next-generation industry entry support project. November 2011: Developed an alkaline spin etching system. Specifications: For large substrates (300 mm square). February 2012: Completion of the next-generation industry entry support project in Saitama Prefecture. April 2012: Newly developed silicon wafer separator for solar cells.