[Technical materials being presented!] Ion plating is optimal for creating highly adhesive films! Technical materials are currently available for free!
Ion plating is a method that involves passing evaporated particles through plasma to give them a positive charge, while applying a negative charge to the substrate to attract the evaporated particles and deposit them, creating a film. This allows for the formation of a film with stronger adhesion compared to traditional vapor deposition methods. **Features of Ion Plating** - Adhesion strength is stronger than that of vacuum deposition. - Good adhesion can be achieved even at low temperatures (with some exceptions for specific film types). - A variety of film formation conditions can be obtained. - Reactive films are possible. - Film coverage on shadows is better than that of vacuum deposition. - Alloy films are possible. *For more details, please request materials or view the PDF data available for download.*
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basic information
【Content】 ○ Attitude of the Ion Plating Department → Shortening of prototype and development time → Reduction of initial costs → Utilization of abundant know-how ○ Thin Film Contract Processing by Toho Chemical Industry Co., Ltd. → From prototype and development to small-lot production ○ Introduction to Toho Chemical Industry Co., Ltd. ○ History of the Ion Plating Department ○ Main Processing Achievements → Pattern coating → Thick film coating → Coating on resin films → Coating on three-dimensional objects → Coating on large areas → Coating by sputtering → Coating by plasma CVD → Various metal film coatings ○ Introduction of New Technologies → Sputtering → Plasma CVD ● For more details, please contact us or download the catalog.
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Our company offers contract processing (coating services) for functional thin films using ion plating, vacuum deposition, sputtering, and plasma CVD. Since our inception, we have focused on "functional thin films" such as conductivity, insulation, and corrosion resistance. We accommodate various types of films, including metal films, reactive films like oxide, carbide, and nitride films, as well as their laminated films. We have established a system to respond to a wide range of requests, from small-scale prototypes, development, and research to medium-sized production runs. Currently, we have 11 deposition devices in operation, ranging from small machines with a diameter of 300mm to inline mass production machines with a film formation area of 1000mm x 900mm. All processes, from the unboxing of substrates entrusted by customers to the packaging of the coated products, are conducted within a clean room. If you are considering functional thin films, please feel free to contact us! Based on our flexible response and over 35 years of experience, we will meet your needs! *Information about our exhibition participation is also available on our website. Please take a look.
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