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  3. Manufacturing and processing machinery
  4. Semiconductor Manufacturing Equipment
  5. Evaporation Equipment
  6. Multi-functional Vacuum Deposition Device "SEC-22C"

Multi-functional Vacuum Deposition Device "SEC-22C"

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last updated:May 23, 2016

昭和真空
昭和真空
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Liftoff, thick film, low-temperature film deposition compatible - the top model that combines Showa Vacuum's technology.

The multifunctional vacuum deposition device "SEC-22C" employs an electron beam evaporation source as its evaporation source. It can deposit high melting point metals and oxides. The control of evaporation rate and film thickness is conducted using a quartz oscillation type thickness gauge. The main pump is equipped with a cryopump. The operation control system is fully automated. 【Features】 ○ The evaporation source and substrate fixture are arranged to achieve a good film thickness distribution. ○ The electron beam evaporation source uses a 6-point crucible, allowing for the deposition of six different materials in the same vacuum. ○ The substrate can hold 30 pieces of φ75mm, 20 pieces of φ100mm, and 9 pieces of φ150mm. ○ Deposition is possible within an incident angle of ±5°. ○ The anti-deposition shield inside the vacuum chamber is divided for easy replacement. For more details, please contact us or download the catalog.

    Evaporation Equipment
11_sec22c.jpg

Multi-functional Vacuum Deposition Device "SEC-22C"

11_sec22c.jpg
11_sec22c.jpg
  • Related Link - http://www.showashinku.co.jp/product/e_SEC-22C.htm…

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【Specifications】 ○Achievable Pressure: Below 6.7×10^-5 Pa ○Exhaust Speed: Up to 4.0×10^-4 Pa within 20 minutes from atmospheric pressure ○Evaporation Source: Electron gun with 270° deflection, power supply 16 kW ○Substrate Heating: MAX 150°C, normal use 100°C ○Film Thickness Distribution: Within ±1% (within batch, between batches) T/S = 900 mm ○Exhaust System: Cryopump, dry pump, mechanical booster pump ○Vacuum Chamber: W800mm × D800mm × H1300mm, made of SUS304 ○Footprint: W3700mm × D4300mm × H2400mm 【Required Specifications】 ○Required Power: Main Unit φ3 200V approximately 40 KVA (115A) Evaporation Source φ3 200V approximately 25 KVA (73A) ○Required Water Volume: Above 0.2 MPa (differential pressure), 44 L/min, 20–25°C ※Maximum pressure at cooling water inlet is below 0.4 MPa, water quality equivalent to city water ○Required Air Pressure: 0.7 MPa (set pressure 0.5 MPa), connection diameter Rc1/2 ○Gas Pressure: 0.05 MPa (set pressure 0.02 MPa), connection diameter SWL1/4 ●For more details, please contact us or download the catalog.

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Applications/Examples of results

【Applications】 ○ Electrode films / Protective films ○ Lift-off film formation ○ Thick film formation ○ Low-temperature film formation ● For more details, please contact us or download the catalog.

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"Vertical incidence is our specialty" Vacuum deposition device SEC-22C

"Vertical incidence is our specialty" Vacuum deposition device SEC-22C

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昭和真空

昭和真空

Industrial Machinery

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Showa Vacuum Co., Ltd. manufactures and sells vacuum technology application devices (vacuum equipment) such as vacuum deposition devices and sputtering devices, primarily focused on equipment that forms thin films on specific substrates in a vacuum.

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