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  6. Optical Process Monitor Optius

Optical Process Monitor Optius

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last updated:Jan 27, 2016

アルバック/ULVAC, Inc.
アルバック/ULVAC, Inc.
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You can monitor the status of various plasma processes in real time. 【ULVAC】

The optical process monitor Optius can monitor the status of various plasma processes in real-time by measuring the emission spectrum of the plasma. It is ideal for MFC control in reactive sputtering and endpoint detection in etching. 【Specifications】 ○ Weight: Main unit (TSC): 4.9kg Expansion unit (ESC, 1ch): 1.3kg ○ Power supply: AC100–240V (50/60Hz) ○ Power consumption: 100W (when using 5 channels) ○ Operating environment: Temperature: 10 – 40°C, Humidity: 15 – 80% RH (without condensation) For more details, please contact us or download the catalog.

    Other measurement, recording and measuring instrumentsOther process controls
15_optius.jpg

Optical Process Monitor Optius

15_optius.jpg
15_optius.jpg
  • Related Link - http://www.ulvac.co.jp/products_j/components/optic…

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basic information

【Features】 ○Wide wavelength range →Measurement wavelengths cover a wide range from 200 to 1000 nm, allowing for simultaneous measurement of multiple specified wavelengths. ○Simultaneous measurement of 5 channels →By adding an optional expansion unit (ESC), simultaneous measurement of up to 5 channels is possible. ○Feedback control →External devices can be controlled via feedback based on measurement results. ○Dedicated software included →Standard dedicated software compatible with processes such as reactive sputtering and etching is included. ○Variety of light receiving units →Two types of light receiving units are available: vacuum type and atmospheric type, allowing for selection based on application. ●For more details, please contact us or download the catalog.

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Applications/Examples of results

【Applications】 ○ Process monitoring in reactive sputtering and feedback control of MFC ○ Endpoint detection in etching processes ○ Confirmation of cleaning status and initialization of etching and CVD equipment ● For more details, please contact us or download the catalog.

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Optical Process Monitor Optius

Optical Process Monitor Optius

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アルバック/ULVAC,

アルバック/ULVAC, Inc.

Electronic Components and Semiconductors

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ULVAC's corporate philosophy aims to contribute to the development of industry and science by comprehensively utilizing vacuum technology and its related technologies. ULVAC brings together its unique technologies cultivated through years of research and development and production technology reform to provide "ULVAC Solutions," which integrate equipment, materials, analytical evaluation, and services in a multifaceted manner for flat panel displays, electronic components, semiconductors, and general industrial equipment. Moving forward, we will continue to firmly embrace changes in the times and the needs of our customers, striving to be a top global manufacturer in all cutting-edge fields.

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