We offer high-quality cylindrical targets, planar targets, and deposition materials for sputtering equipment at reasonable prices.
The following methods will be used to produce cylindrical targets. 1. Method: Integrated extrusion of melting materials Typical materials: Ti, Al, Cu Advantages: No risk of breaking, can rotate at low speeds Disadvantages: No high-purity products available 2. Method: Plasma spray Typical materials: Si, Ag, ZnAl, etc. Advantages: Relatively low risk of breaking, inexpensive Disadvantages: Difficult to achieve high-purity products above 5N, prone to defects, takes time to start up Note: Initial startup time can be shortened depending on the surface finishing method 3. Method: Cold spray Typical materials: Ag, etc. Advantages: Relatively low risk of breaking, can be sprayed directly onto used targets. Disadvantages: More expensive than plasma spray method. Takes time to start up. Note: Same as above 2 4. Method: Indium bonding of cast targets Typical materials: Special alloys, etc. Advantages: High-purity products are possible. Disadvantages: Risk of arcing from cuts. Can break or melt indium at low rotation speeds. Expensive. Low power input limit. 5. Method: Indium bonding of sintered targets Typical materials: ITO, AZO, etc. Advantages: High-purity products are possible. No restrictions on materials. Disadvantages: Same as above 4.
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basic information
Manufacturer: PMI Corporation, USA Manufacturing Method: Plasma spraying, bonding of sintered targets, monolithic, casting, etc. The appropriate manufacturing method is selected based on material type, density, and purity. Purity: Please inquire. Maximum target outer diameter: 180mm (target thickness 23.5mm) Backing tube material: SUS, Ti, etc. Backing tube dimensions: Inner diameter 125mm × outer diameter 133mm × length 200mm × 4000mm Inner diameter 80mm × outer diameter 88mm × length 200mm × 4000mm, etc.
Price range
Delivery Time
※Please contact us.
Applications/Examples of results
Supply cylindrical targets: Si cylindrical target NiCr cylindrical target Mo cylindrical target Cr cylindrical target Al cylindrical target Nb cylindrical target Cu cylindrical target In cylindrical target ITO cylindrical target Ta cylindrical target TiAl cylindrical target Ag cylindrical target Ni cylindrical target Ti cylindrical target ZnAl cylindrical target AZO cylindrical target SiAl cylindrical target TiOx cylindrical target NbOx cylindrical target Other alloy cylindrical targets, etc.
Detailed information
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Flat targets We can also provide various types of flat targets.
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Deposition materials We can provide various types of deposition materials, available in powder form to pellet form.
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AZO cylindrical target This is an AZO cylindrical target. A sleeve-shaped AZO target made by the sintering method is carefully bonded to a titanium backing tube to create a single target.
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Silicon cylindrical target This is a silicon cylindrical target made using the plasma spraying method. There are two types: one with approximately 2 wt% aluminum (Al) added and another with boron added at the PPM level.
Company information
This is the Japanese sales office of Sputtering Components Inc, commonly known as SCI, a leading company in rotary cathodes frequently used in sputtering devices. We also handle cylindrical sputtering targets and planar targets from SCI's sister company, Process Materials Inc, commonly known as PMI. We would be grateful if you could feel free to contact us.