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This series is a resist coating, developing, and baking device that can be adapted to all areas related to semiconductor manufacturing processes, from research and development applications to production applications. It features a highly flexible design, making it ideal for both research and development as well as mass production specifications. Additionally, it is equipped with a coating unit and a developing unit, allowing for easy switching between 2” and 8” wafers. 【Features】 ■ Highly flexible design ■ Equipped with coating unit and developing unit ■ Capable of supporting mass production specifications *For more details, please refer to the catalog or feel free to contact us.
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【Lineup】 ■LITHOTRAC Dual-1000 ■LITHOTRAC CB-50 ■LITHOTRAC DB-50 *For more details, please refer to the catalog or feel free to contact us.
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For more details, please refer to the catalog or feel free to contact us.
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Riso Tech Japan, since its establishment, has been a specialist in lithography, providing not only resist exposure/development analysis equipment, resist coaters/developers, and lithography simulators, but also evaluation of exposure/development materials for cutting-edge lithography processes. In particular, for resist processing equipment, we propose optimal specifications tailored to customer needs, adapting spin coaters, developers, bake (PEB) equipment, and film thickness measurement to various fields, ranging from development experimental equipment to fully automated production systems. For example, we offer coating equipment for various substrates such as ultra-thin silicon wafers, various compound semiconductors, quartz, sapphire, and piezoelectric substrates (SAW), including ArF resist, EB resist, high-viscosity thick-film resist, polyimide, insulating films, and wax, as well as development equipment for alkaline, inorganic, and organic materials. Additionally, we provide various process units such as HMDS treatment, vacuum bake, UV irradiation, and high-temperature bake processing.
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