We are offering a technical document that explains thin film processing technology that imparts new functions to materials! It includes various surface treatment and thin film coating methods! We support everything from prototypes to production projects.
Toho Kaken Co., Ltd. offers contract processing (coating services) for functional thin films using ion plating, vacuum deposition, sputtering, and plasma CVD. We have established a system to respond to a wide range of requests, from small-scale projects such as prototypes, development, and research to medium-sized production projects, accommodating various types of films including metal films, reactive films such as oxide, carbide, and nitride films, alloy films, and their multilayer films. Please feel free to contact us when considering functional thin films! Based on our flexible response and over 35 years of experience, we will meet your needs! Additionally, this document includes features of each coating method, as well as coating examples and pattern formation. If you are interested, please download the materials or feel free to contact us.
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【Contents】 ■Wet plating and dry plating ■Vacuum deposition method ■Ion plating method ■Sputtering method ■Plasma CVD method ■Characteristics of various film formation methods ■Coating examples ■Patterned film formation, etc. 【Overview of Various Film Formation Methods】 ■Vacuum Deposition Method - A method that forms a film by evaporating (sublimating) the material to be made into a film in a vacuum, allowing the vapor to reach the substrate and deposit. ■Ion Plating Method - A method that forms a film by passing evaporated particles through plasma to give them a positive charge, applying a negative charge to the substrate to attract the evaporated particles and deposit them. ■Sputtering Method - A method that forms a film by colliding high-energy particles, generated by plasma, with the material, causing particles of the material to be ejected and deposited on the substrate. ■Plasma CVD Method - A method that forms a film by introducing a gas containing the elements to be made into a film, exciting or decomposing it with plasma, and allowing it to adsorb and react on the substrate surface. *For more details, please refer to the catalog or feel free to contact us.
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[Target Objects] A wide range including glass, ceramics, resin materials, metal materials, and Si wafers, capable of handling three-dimensional objects as well.
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Our company offers contract processing (coating services) for functional thin films using ion plating, vacuum deposition, sputtering, and plasma CVD. Since our inception, we have focused on "functional thin films" such as conductivity, insulation, and corrosion resistance. We accommodate various types of films, including metal films, reactive films like oxide, carbide, and nitride films, as well as their laminated films. We have established a system to respond to a wide range of requests, from small-scale prototypes, development, and research to medium-sized production runs. Currently, we have 11 deposition devices in operation, ranging from small machines with a diameter of 300mm to inline mass production machines with a film formation area of 1000mm x 900mm. All processes, from the unboxing of substrates entrusted by customers to the packaging of the coated products, are conducted within a clean room. If you are considering functional thin films, please feel free to contact us! Based on our flexible response and over 35 years of experience, we will meet your needs! *Information about our exhibition participation is also available on our website. Please take a look.