Ideal for wafer transport in acidic and alkaline mist environments!
The "STWHR4156 series" is a waterproof twin-arm 4-axis cylindrical coordinate clean robot. It is suitable for wafer transport in an acidic and alkaline mist atmosphere during the LSI manufacturing process. We also offer a variety of clean robots, so please feel free to consult us. 【Features】 ■ Arm variation is 156mm ■ Z-axis variation is 200mm and 300mm ■ Load capacity is 3kgf or less when calculated at the third joint of the arm ■ The arm section is coated with Teflon to ensure corrosion resistance ■ The arm joint section uses V-seals for waterproofing *For more details, please refer to the catalog or feel free to contact us.
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【Other Features】 - The joints of the components are sealed with a Viton gasket. - Waterproof structure for the Z-axis can accommodate bellows. - Adoption of a twin-arm design reduces wafer exchange time. - Equipped with a motion monitor. - Control methods include RS232C and parallel photo I/O. - All axes use 2-phase stepping motors. - High-speed and high-precision wafer transport is achieved through S-curve acceleration and deceleration control. - Wafer retention using vacuum suction, drop-in, and edge grip chucks. - Compatible with optimal chucks tailored to the transported items and equipment layout. *For more details, please refer to the catalog or feel free to contact us.
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【Usage】 ■Wafer transport in acidic and alkaline mist environments, etc. *For more details, please refer to the catalog or feel free to contact us.
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