If you need etching processing, please consult our company.
At Kawai Optical Co., Ltd., we mainly perform etching processing of metal films and dielectric multilayer films that have been deposited on glass substrates. The maximum substrate size is 200mm x 200mm, and the minimum line width is 10μm. Additionally, depending on the desired etching area, it may be possible to etch in sizes other than those mentioned above, so please feel free to contact us. 【Features】 ■ Compatible with metal films and dielectric multilayer films ■ Can accommodate desired materials and dimensions *For more details, please refer to the catalog or feel free to contact us.
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【Scope of Support】 ■ Maximum board size: 200mm × 200mm ■ Minimum line width: 10μ *For more details, please refer to the catalog or feel free to contact us.
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Applications/Examples of results
【Applications】 ■ Patterning ■ Semiconductor-related ■ Measurement equipment, etc. *For more details, please refer to the catalog or feel free to contact us.
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Kawai Optical Co., Ltd. is a company primarily engaged in optical products and vapor deposition components. Since its establishment, it has consistently promoted unique research and development in the field of vacuum deposition technology. Currently, thin film formation through vacuum deposition, which has become one of the important technologies in the field of optics, is provided by our company with excellent technology and engineering to satisfy our customers. For vapor deposition components or used vapor deposition equipment parts, please feel free to consult us.