Maximum film formation area 400mmΦ・315mm□! Film deposition of various thin films by sputtering.
We offer contract film deposition of various metal materials, oxide film materials, etc., and we specialize in film deposition on plastic substrates. The usual delivery time is about one week, and patterned film deposition is also possible upon request. First, please let us know the material you wish to deposit and the substrate you will use. Based on your requirements, we will determine the pre-treatment conditions, deposition conditions, film thickness, etc. 【Available Substrates】 ■ Glass ■ Metal ■ Ceramic ■ Si wafers ■ Various plastic materials *For more details, please download the PDF or feel free to contact us.
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basic information
【Film-Forming Materials】 ■Pt ■Au ■Ag ■Cu ■Ti ■Cr ■Al ■Sn ■Zn ■Ni ■Si ■C ■ITO ■TiO2 ■Al2O3 ■SiO2 *For more details, please download the PDF or feel free to contact us.
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Company information
Asteratech Co., Ltd. offers contract thin film deposition services, thin film experimental equipment, experimental glass substrates, and technical consulting as part of its business activities. Additionally, our company possesses deposition technologies such as sputtering, which utilizes a type of vacuum deposition method where plasma generated by DC or RF power strikes the target material and deposits it onto the substrate. Please feel free to contact us if you have any inquiries.