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  6. Study on the decomposition using hydrofluoric acid and nitric acid in the analysis of impurities in silicon.

Study on the decomposition using hydrofluoric acid and nitric acid in the analysis of impurities in silicon.

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last updated:Sep 12, 2018

ビーエルテック
ビーエルテック
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Minimize exposure to hydrofluoric acid gas for people and improve the work environment! Also contributes to reducing work hours.

This technical document discusses the automatic pre-treatment using hydrofluoric acid and nitric acid for the silicon decomposition (melting) of semiconductor materials and other raw materials, utilizing the automatic pre-treatment device "DEENA" with acid addition and other processes controlled by a PC. When analyzing the silicon (metallic silicon, Si) content and impurities in semiconductor materials, hydrofluoric acid is often used. However, hydrofluoric acid is highly reactive with silicon, requiring careful addition in very small amounts, and during this process, a large amount of hydrofluoric gas is released, necessitating precautions against human exposure. Therefore, we examined the automatic pre-treatment using hydrofluoric acid and nitric acid for the silicon decomposition (melting) of semiconductor materials and other raw materials with DEENA, which can perform tasks such as acid addition, stirring, and measurement automatically under PC control. [Contents] ■ Purpose ■ Overview ■ Reagents Used ■ Analysis Flow, etc. *For more details, please refer to the PDF document or feel free to contact us.

    Analytical Equipment and Devices
★シリコン中の不純物分析におけるふっ酸。硝酸を用いた分解の検討.png

Study on the decomposition using hydrofluoric acid and nitric acid in the analysis of impurities in silicon.

★シリコン中の不純物分析におけるふっ酸。硝酸を用いた分解の検討.png
★シリコン中の不純物分析におけるふっ酸。硝酸を用いた分解の検討.png image_11.jpg
  • Related Link - http://www.bl-tec.co.jp/
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【Basic Performance of the Device】 <DEENA60 Main Unit> ■ Automatic addition of reagents (up to 8 types of reagents can be installed) ■ Stirring by shaker ■ Heating by hot plate ■ Cooling ■ Automatic addition of internal standard solutions and standards ■ Meniscus adjustment using ultrasonic height sensor *For more details, please refer to the PDF document or feel free to contact us.

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Presentation of Technical Data: Examination of Decomposition Using Hydrofluoric Acid and Nitric Acid in Impurity Analysis of Silicon

Presentation of Technical Data: Examination of Decomposition Using Hydrofluoric Acid and Nitric Acid in Impurity Analysis of Silicon

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ビーエルテック

ビーエルテック

Testing, Analysis and Measurement

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The auto-analyzer developed by the former Technicon Corporation, a global pioneer in continuous flow analysis devices, is still widely used in analytical laboratories around the world today. In Japan, it continues to operate as an essential device in national and public research institutes, testing laboratories, and corporate factories and testing facilities. Our company, BL Tech Co., Ltd., has inherited approximately 40 years of auto-analyzer business in Japan and is focusing on the development and manufacturing of optimal continuous flow analysis devices to meet the current hot demand.

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