『R*evolution V』

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last updated：Feb 13, 2020

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Intelligent process control for on-wafer processing

"R*evolution V" is a product that integrates proven low magnetic field toroidal plasma technology, advanced communication capabilities, and high-precision power control functions. The remote plasma source in this series is suitable for oxygen radical-based applications such as photoresist stripping and various surface treatments. Additionally, the EtherCAT communication protocol enables near real-time information provision of critical plasma source operating parameters to process tools and factory networks. This product can circulate information to process tools and factory databases to support monitoring and modification of process parameters and operational diagnostics (APC/FDC) applications, ensuring high operational rates of process tools. [Features] - Function-integrated unit that can be directly installed in the chamber - Quartz applicator for high-density oxygen-based plasma - Output up to 6kW - High output reproducibility - High precision output control <1% *For more details, please refer to the PDF document or feel free to contact us.

Related Link - https://www.mksinst.com/Intl/JP1.aspx

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【Other Features】 ■ High-speed, high-reliability ignition ■ THD resistance against power quality disturbances in the factory ■ Support for applications such as photoresist removal, gate nitridation, oxidation, selective etching, and wafer pre-cleaning *For more details, please refer to the PDF document or feel free to contact us.