Compatible with immersion and spray methods! Introducing a mixture of caustic alkali and high-boiling solvents.
"Unrust RW-C" is a photoresist stripping solution that offers strong peeling and cleaning properties for resins, compatible with both immersion and spray methods. It is suitable for the regeneration and cleaning of glass substrates and for the stripping of resin resist. It is a mixture of caustic alkali and high-boiling solvents. 【Processing Conditions】 ■ Concentration: Undiluted treatment ■ Temperature: 50–70°C ■ Time: Approximately 5 minutes *For more details, please refer to the PDF document or feel free to contact us.
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【Other Features】 ■Target Materials: Dry Film, Positive Resist ■Industries Used: Electronics Industry *For more details, please refer to the PDF document or feel free to contact us.
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【Purpose】 ■Recycling and cleaning of glass substrates, peeling of resin resist *For more details, please refer to the PDF document or feel free to contact us.
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Sanraku Pure Chemical Research Institute started with the repackaging and blending of inorganic chemicals, and now we are engaged in contract manufacturing and sales of precision chemical products, as well as the development and production of our original resist stripping agents and metal surface treatment chemicals. We have always prioritized safety, stable high quality, reasonable pricing, and speedy responses, and we will continue to enhance the "power of manufacturing."