We will assist in evaluating the conditions for new development of photosensitive resists, polyimide coatings, and substrate development such as PET and PEN.
- I just want you to apply our company's resist. - Is there anywhere that can do just exposure and development? - I want the film-coated substrate to be peeled off! - I want to work in a clean room. - I want to get small glass as cheaply as possible!
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We offer a full course from regular cleaning and resist coating to packaging, as well as partial processing such as cleaning and resist coating only, exposure and development only, and etching to edge trimming. *Resist coating to exposure and development is performed in a clean room. We assist in developing evaluation conditions for substrates such as PET and PEN, including resist and polyimide coating. Additionally, we can create evaluation reports based on your requirements. In addition to assisting with small lot evaluations, please consult us for mass production support.
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We will assist in evaluating the conditions for new development of photosensitive resists, polyimide coatings, and substrate development such as PET and PEN.
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Specifically, we receive requests for patterning processing on substrates for ACF, organic EL, material evaluation, MEMS, solar cells, and equipment evaluation using photolithography and etching technology from various companies, public research institutions, and research and development departments of universities. We specialize in fine pitch patterning of thin metal films, but we can also consider processing methods for thick films depending on the specifications, so please feel free to consult with us. Additionally, we also accept sputtering deposition processing only. We handle processing not only for glass substrates but also for various film substrates such as PC, PET, and PI. We also accept orders for substrate and film arrangement.