We offer a variety of products, including diamond slurries and polishing agents for CMP!
Introducing Musashino Electronics' "Abrasives." They can be selected to match various samples, including polycrystalline and single crystal, water-soluble and oil-based, and amphoteric types. Please feel free to contact us when you need assistance. 【Product Lineup】 ■ Diamond slurry ■ GC abrasives (green silicon carbide) ■ WA abrasives (white alumina) ■ Cerium oxide abrasives ■ Colloidal silica abrasives ■ CMP abrasives 【Examples of Materials with Processing Achievements】 ■ Semiconductor materials (silicon, germanium, silicon carbide, strontium silicate, gallium arsenide, indium gallium arsenide, indium phosphide, indium gallium zinc oxide, gallium nitride, gallium oxide, etc.) ■ Optical materials (quartz glass, sapphire, fluorite lenses, spinel, phosphate glass, lithium borate, acrylic resin, etc.) ■ Ceramic materials (alumina, zirconia, ferrite, etc.) ■ Metal materials (steel materials, stainless steel, copper, gold, silver, platinum, aluminum, titanium, molybdenum, etc.) *For more details, please refer to the PDF document or feel free to contact us.
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P2
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P3
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Our company has been manufacturing polishing equipment, cutting machines, and scribers suitable for precision machining using the technical know-how we have cultivated over many years. We have a significant track record, particularly in cutting-edge technology fields such as semiconductors, ceramics, and optical communications. In addition to standard specification equipment, we also accept the design and manufacture of custom specifications tailored to our customers' needs. To meet the increasing demands for precision in machining and the diversifying needs, we will continue to advance with innovative ideas and technology.