Examples of thin film evaluation
The evaluation of thin films is determined by the purpose for which the thin film is used. For example, if the thin film is used for enhancing mechanical strength, important factors for evaluation include hardness and adhesion. If the film is intended to impart optical properties, values such as reflectance and transmittance become significant. Our company strives to meet customer needs using evaluation equipment as listed below.
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basic information
Morphological observation [Scanning electron microscope ・ Digital microscope ・ Stereomicroscope] Elemental analysis [Energy dispersive X-ray analyzer] Adhesion force measurement [Ultra-thin film scratch tester ・ Tensile tester] Optical properties [Spectrophotometer] Resistance value measurement [Low resistance meter ・ High resistance meter] Contact angle measurement [Contact angle meter] Hardness measurement [Micro Vickers hardness tester] Dimensional measurement [Small measurement microscope ・ Digital microscope]
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Applications/Examples of results
Morphological observation Elemental analysis Adhesion force measurement Optical properties Resistance value measurement Contact angle measurement Hardness measurement Dimensional measurement
Detailed information
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The surface of the coating film is scratched with a stylus (something like a needle) while applying a load, forcibly peeling the film to measure the adhesion strength.
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The adhesion strength between the coating film and the substrate (the object to which the film is applied) is determined as a relative value under certain conditions. It is used to compare adhesion strength when the conditions for film formation are changed.
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This is a cross-sectional photo coated with a 10μm silver film using the ion plating method.
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The areas where Si is detected in large quantities through mapping indicate that there is a high presence of the Si element.
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It can be seen from the graph above that Si has been detected in the analysis. (Characteristic X-ray analysis)
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This is the transmittance curve of glass coated with an ITO film and a two-layer film with SiO2 deposited under the ITO film. A difference in transmittance can be observed at a certain wavelength.
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Automatically create indentations according to specifications, and then automatically generate hardness distribution. It can be seen that the center is close to raw, while the hardness increases towards the periphery.
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Company information
Our company offers contract processing (coating services) for functional thin films using ion plating, vacuum deposition, sputtering, and plasma CVD. Since our inception, we have focused on "functional thin films" such as conductivity, insulation, and corrosion resistance. We accommodate various types of films, including metal films, reactive films like oxide, carbide, and nitride films, as well as their laminated films. We have established a system to respond to a wide range of requests, from small-scale prototypes, development, and research to medium-sized production runs. Currently, we have 11 deposition devices in operation, ranging from small machines with a diameter of 300mm to inline mass production machines with a film formation area of 1000mm x 900mm. All processes, from the unboxing of substrates entrusted by customers to the packaging of the coated products, are conducted within a clean room. If you are considering functional thin films, please feel free to contact us! Based on our flexible response and over 35 years of experience, we will meet your needs! *Information about our exhibition participation is also available on our website. Please take a look.