In-plane temperature distribution measurement tool for semiconductor manufacturing equipment 'T/C Wafer'
Real-time transmission of temperature changes and temperature distribution to the logger! You can accurately grasp temperature characteristics.
The "T/C Wafer" is a tool for measuring in-plane temperature distribution that can measure the actual temperature of the wafer in real time for semiconductor manufacturing equipment. By understanding the actual temperature distribution characteristics affecting the wafer, it contributes to the simplification of process temperature settings and controls, as well as improving the uniformity of film thickness distribution, not just relying on the set temperature on the equipment side. Thanks to its unique embedded technology, it also reduces solid differences in the temperature contact point positions, resulting in high reliability of the measured temperature. 【Features】 ■ Real-time measurement of the actual temperature of the wafer ■ High reliability of the measured temperature ■ Contributes to the simplification of process temperature settings and controls, and improves the uniformity of film thickness distribution ■ Reduces solid differences in temperature contact point positions through unique embedded technology ■ Achieves high reliability of the measured temperature *For more details, please refer to the PDF document or feel free to contact us.
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basic information
【Specifications (Partial)】 ■Wafer ・Size: 3 to 12 inches (can also accommodate square glass substrates, etc.) ・Type: Bare silicon (standard), other special specifications such as films are supported with user-supplied materials ■Number of measurement points: 1 to 34 points (embedding positions can be specified at will, but the minimum distance from the wafer edge must be 5mm or more) ■Connector: Various types supported (D-type multi-connector, 2-pin mini connector, Y-type terminal, ceramic connector, bare wire only, etc.) ■Delivery time: Usually within 4 weeks, etc. *For more details, please refer to the PDF document or feel free to contact us.
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Applications/Examples of results
【Application】 ■ PVD equipment, CVD equipment, diffusion furnaces, hot plates, photoresists, etc. (Use in environments where plasma waves are directly exposed is not permitted) * For LCD and solar cell manufacturing equipment, please contact us separately. * For more details, please refer to the PDF materials or feel free to contact us.
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Miyabi International Co., Ltd.