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  6. High-Density Radical Source "HDRS-114"

High-Density Radical Source "HDRS-114"

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last updated:Oct 06, 2021

片桐エンジニアリング
片桐エンジニアリング
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To realize a better plasma source, we will return to the fundamentals of plasma science!

The HDRS-114 is a high-density radical source designed for ultra-high vacuum applications, achieving both high-speed crystal growth and high-quality crystal growth. It adopts a hybrid plasma source that is not found in conventional radical sources, achieving a radical supply that is 100 times greater than traditional products. Our original hybrid plasma structure generates high-density radicals. 【Features】 - Achieves both high-speed crystal growth and high-quality crystal growth - Designed for ultra-high vacuum applications - Adopts a hybrid plasma source not found in conventional radical sources - Achieves a radical supply that is 100 times greater than traditional products (as measured by us) - Our original hybrid plasma structure generates high-density radicals *For more details, please refer to the PDF document or feel free to contact us.

    Other machine elements
2021-10-05_11h38_39.png

High-Density Radical Source "HDRS-114"

2021-10-05_11h38_39.png
2021-10-05_11h38_39.png
  • Related Link - http://www.kk-eng.co.jp/index.html

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【Points】 ■Correctly understand the process by which nitrogen molecules become atomic radicals  →About 14 eV of energy is required to excite nitrogen molecules into a plasma state. ■Reevaluate plasma sources with a correct understanding of plasma science  →Focusing on the dissociation of nitrogen molecules into a plasma state, it is believed that conventional plasma sources are not sufficiently able to create plasma from nitrogen molecules, as there are almost no electrons present in the necessary energy range for ICP plasma sources. ■Reflect a correct understanding of plasma science in plasma sources  →A new plasma source that hybridizes ICP and CCP, which has never been seen before. ■Accurately measure and verify the amount of radicals necessary for film formation  →A plasma source that measures and guarantees the important atomic radical density for film formation. *For more details, please refer to the PDF document or feel free to contact us.

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High-Density Radical Source "HDRS-114"

High-Density Radical Source "HDRS-114"

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片桐エンジニアリング

片桐エンジニアリング

Other manufacturing

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Since its establishment in 1991, KKE has received your generous support and cooperation, for which we are deeply grateful. Before the founding, I dedicated myself to technical operations. Drawing on what I learned during that time, KKE has grown together with all of you. Particularly, we have focused on "development, design, and manufacturing" in the field of vacuum technology without having standardized products, and we have had the pleasure of collaborating with industry, government, and academia. We have maintained a commitment to thoroughly engage in "development, design, and manufacturing" tailored to the specific requirements of our customers, making progress based on accurate judgments to meet their needs. Aiming to be a development-oriented company capable of responding to cutting-edge science and technology in the 21st century, we strive to contribute to society through "manufacturing" and to achieve happiness together with all of you. We look forward to your continued support for KKE.

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