Processing available for resin black, polyimide, and photosensitive Ag, etc.! We also introduce processing achievements!
We offer "photosensitive resin patterning" services. For an effective area of φ300mm, the maximum processing size is 300mm×300mm. We can process materials such as resist, polyimide, resin black, and photosensitive Ag (MAX 170□). We have processing achievements with both polyimide and photosensitive Ag having line and space of 10μm. 【Features】 <Processable Film Types> ■ Resist, polyimide, resin black, photosensitive Ag (MAX 170□), etc. <Processing Size> ■ MAX: 300mm×300mm ※ Effective area: φ300mm *For more details, please feel free to contact us.
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【Processing Results】 ■Resist ・Line 3μm / Space 3μm ■Polyimide / Photosensitive Ag ・Line 10μm / Space 10μm ■Resin Black ・Line 7μm / Space 15μm *For more details, please feel free to contact us.
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Specifically, we receive requests for patterning processing on substrates for ACF, organic EL, material evaluation, MEMS, solar cells, and equipment evaluation using photolithography and etching technology from various companies, public research institutions, and research and development departments of universities. We specialize in fine pitch patterning of thin metal films, but we can also consider processing methods for thick films depending on the specifications, so please feel free to consult with us. Additionally, we also accept sputtering deposition processing only. We handle processing not only for glass substrates but also for various film substrates such as PC, PET, and PI. We also accept orders for substrate and film arrangement.