Pattern shapes can be linear or circular! Are you struggling to create high-precision jigs with uneven surfaces?
We offer "fine structure formation" services. We customize molds with μm precision using various resist materials and provide them on evaluation substrates. Pattern shapes can be linear or circular (cylindrical), and we can achieve an aspect ratio of 5:1 (with a film thickness of 50μm or more), having experience up to 3:1. Are you struggling to create high-precision jigs with uneven substrates? Please feel free to contact us when you need assistance. 【Features】 ■ Customized molds with μm precision using various resist materials provided on evaluation substrates ■ Pattern shapes can be linear or circular (cylindrical) ■ Aspect ratio of 5:1 (with a film thickness of 50μm or more) possible (experience up to 3:1) *For more details, please feel free to contact us.
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Specifically, we receive requests for patterning processing on substrates for ACF, organic EL, material evaluation, MEMS, solar cells, and equipment evaluation using photolithography and etching technology from various companies, public research institutions, and research and development departments of universities. We specialize in fine pitch patterning of thin metal films, but we can also consider processing methods for thick films depending on the specifications, so please feel free to consult with us. Additionally, we also accept sputtering deposition processing only. We handle processing not only for glass substrates but also for various film substrates such as PC, PET, and PI. We also accept orders for substrate and film arrangement.