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  6. High Flow Type Inline Ultra High Purity Gas Purifier "FPI-300"

High Flow Type Inline Ultra High Purity Gas Purifier "FPI-300"

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FPI-300

last updated:Oct 28, 2025

大阪ガスリキッド
大阪ガスリキッド
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Inline ultra-high purity gas purifier Fine Purifier "High flow type of 300NL/min"

The "Fine Purifier FPI-300" purifies various impurities (O2, H2O, CO2, CO) in nitrogen gas to below 1 ppb. The flow rate range is up to 300 NL/min. It comes standard with a 0.003 µm particle filter. It can be reused by regeneration. 【Features】 ■ Thorough cost management ■ Delivery possible within 3 weeks ■ Made in Japan ■ Long-term use at low cost *For more details, please refer to the PDF document or feel free to contact us.

    Gas recovery/treatment equipment
FPI-300.png

High Flow Type Inline Ultra High Purity Gas Purifier "FPI-300"

FPI-300.png
FPI-300.png
  • Related Link - https://www.liquidgas.co.jp/product/gas02.html

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basic information

【Product Specifications (Partial)】 ■Applicable Gas: N2 (*1) ■Impurities to be Removed: O2, CO, CO2, H2O ■Raw Gas Purity: Equivalent to 5N gas cylinder or higher ■Impurity Concentration of Purified Gas for Each Target Component: Less than 1 ppb ■Operating Pressure: Between 0.3 MPaG and 0.98 MPaG ■Maximum Pressure: 0.98 MPaG ■Maximum Flow Rate: 300 NL/min ■Pressure Loss: 34 kPa (*2) ■Operating Temperature: Room Temperature (both environment and gas temperature) ■Lifespan/Purification Volume (*3): Approximately 36,000 Nm3 ■Material (Casing): SUS316L ■Dimensions: Φ76.3mm × L667.6mm ■Connection Diameter: 1/2 inch VCR fitting (male) *1: Please consult separately regarding Ar, He, Ne, Xe, Kr, and H2. *2: Pressure loss when maximum flow is achieved at an inlet pressure of 0.3 MPaG. *3: This is a provisional reference value and may change. *For more details, please refer to the PDF document or feel free to contact us.

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【Applications】 ■ Carrier gas for analytical instruments, zero gas ■ Semiconductor manufacturing equipment, CVD equipment ■ Atmosphere gases and purge gases requiring high purity ■ Shielding gas for welding *For more details, please refer to the PDF document or feel free to contact us.

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High Flow Type Fine Purifier FPI-300

High Flow Type Fine Purifier FPI-300

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大阪ガスリキッド

大阪ガスリキッド

Electricity, Gas and Water Industry

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Osaka Gas Liquid Co., Ltd. was established in 1991 as a wholly-owned subsidiary of Osaka Gas. The company focuses on the manufacturing and sales of industrial gases and dry ice utilizing the cold energy from liquefied natural gas (LNG) imported by Osaka Gas, as well as developing low-temperature grinding using liquefied nitrogen and related industrial gas technologies in collaboration with group companies.

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