A surface structure analysis device equipped with an EB evaporator suitable for the fabrication of metal thin films!
The "Ultra High Vacuum Surface Structure Analysis Device" is a surface analysis instrument capable of performing LEED diffraction patterns, Auger analysis, and temperature-programmed desorption analysis for semiconductors and model catalysts. The analyzer is equipped with a LEED/AES mass spectrometer and features an EB evaporator suitable for metal thin film fabrication. Please feel free to contact us if you have any inquiries. 【Specifications】 ■ Surface analysis system: LEED/AES ■ Evaporation source: Ultra high vacuum evaporator "AEV series" ■ Gas source: Hydrogen cracking gun "AEV series" ■ Sample heating: Direct electric heating type (TC contact type sample holder) ■ Sample manipulator: 5-axis operation with X, Y, Z, θ, and in-plane rotation axis, etc. *For more details, please contact us.
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Since our establishment in 1997, we have been dedicated to creating advanced technologies of the times based on vacuum technology applications. From design to installation of vacuum systems and equipment, we strive for continuous improvement in technology to provide products that emphasize "customer satisfaction" through consistent quality management.
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