Special processing: Silicoat processing

A thin film is formed on the inner surface of the glass container! Achieving reduced leaching of alkali metals!

"Silicoat processing" is a metal ion suppression technology that applies thin film formation techniques. By forming a silicon dioxide (SiO2) thin film on the inner surface of glass containers, it effectively suppresses the leaching of metals derived from borosilicate glass. This enhances the stability of formulations, making it safe to use for formulations that require pH control. Additionally, due to the effect of the thin film, the formulation no longer comes into direct contact with the inner surface of the glass, which is expected to help suppress flaking (interlayer delamination). 【Features】 - Heat treatment is performed while introducing silicoat gas into the inner surface of the glass container. - A thin film of silicon dioxide (SiO2) is formed. - It utilizes thin film formation technology. - Since the film is formed through a chemical reaction, it is a significant technology for preventing film separation (delamination). *For more details, please refer to the PDF document or feel free to contact us.*

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