Utilizing high-output xenon excimer lamps! Introduction to the film deposition rate of the light CVD method.
By forming a thin film on the surface of metals and polymer materials, it is possible to control the mechanical, thermal, chemical, and electrical properties of the material's surface. Various methods are employed for the film formation of thin films used in this surface modification, including vacuum deposition, PVD, and plasma CVD methods. It is expected that the exploration and development of new film formation methods will continue in the future. In this document, we present the results of our examination of the potential of a thin film manufacturing process using a "high-output xenon excimer lamp." [Contents] ■ Introduction ■ Film formation speed of the photochemical CVD method using a "high-output xenon excimer lamp" ■ Conclusion *For more details, please refer to the PDF document or feel free to contact us.
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Quark Technology Co., Ltd. manufactures and sells various industrial equipment using cutting-edge optical application technology. Through the development of vacuum ultraviolet and UV-LED light sources, we have introduced manufacturing technologies for semiconductors, new displays such as LCDs, PDPs, films, and EL, as well as various electronic materials and devices. Additionally, we are planning research and development to address the demand for waste and environmental management equipment, which are pressing medical and social issues. All matter is composed of atoms, nucleons, and "quarks." At Quark Technology, we continue to research light and challenge ourselves in industrial application technologies.