Measurement of film thickness distribution of thin films using EPMA.

Measurement of film thickness in extremely small areas is now possible! Film thickness is calculated from the intensity of characteristic X-rays generated during electron beam irradiation.

We conduct thickness distribution measurements of thin films using EPMA. Thickness measurements of thin films are primarily performed using X-ray fluorescence and X-ray reflectivity methods. Since these methods use X-rays as the incident source, they can only measure the average thickness over a relatively wide measurement area. In contrast, by utilizing electron beams, we are now able to measure the thickness in extremely small areas (approximately 1μm²) and also perform thickness distribution mapping, so please make use of this capability. 【Features】 ■ Measurement principle: Thickness is calculated from the intensity of characteristic X-rays generated during electron beam irradiation. ■ Equipment used: EPMA ■ Spatial resolution: Approximately 1μm ■ Maximum measurable thickness: Approximately 1μm ■ Minimum mapping area: Approximately 80×80μm *For more details, please refer to the related links or feel free to contact us.

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