Providing a pump-integrated process lid! A design concept that adapts to customer requirements.
Our components can be used in packages as drop-in magnetic lids or as side-mounted process units for a wide range of applications. Gas introduction designs as nozzles or binary channels, available in single or multi-segment configurations. A toolbox with various magnetic field designs and end block types. Gas introduction designs tailored to your process needs. Setup dependent on the application can be done without restrictions. 【Features】 ■ Field-proven technology in various application areas ■ Offers process lids with built-in pumps ■ A wide range of flat and rotary cathode designs to accommodate various types of applications ■ Gas introduction designs as nozzles or binary channels, available in single or multi-segment configurations ■ Multi-anode solutions and magnetron designs that meet high-temperature process conditions for horizontal, vertical, and R2R film applications *For more details, please refer to the PDF document or feel free to contact us.
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basic information
**Benefits (Excerpt)** ■ Design concept adapted to customer requirements ■ Space-saving installation or separation of different processes ■ Process setup from DC to pulse DC, pulse AC, bipolar, and RF ■ Gas introduction design tailored to customer process needs ■ Application-dependent setups can be done without restrictions *For more details, please refer to the PDF document or feel free to contact us.*
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For more details, please refer to the PDF document or feel free to contact us.
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Our company is located in Tokyo, where we support VON ARDENNE's sales activities and strategic business development. Additionally, our service engineers support the equipment of Japanese customers. We have installed building material glass coating systems, roll-to-roll web coaters, solar cell sputtering systems, and electron beam systems. Please feel free to contact us if you have any inquiries.
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