For catalytic CVD and iCVD applications! Integrated gas distribution system.
We provide hot wire sources for catalytic CVD and iCVD applications. Special linear energy sources are available for inline and dynamic film deposition processes. They consist of specially designed source flanges and quickly attachable wire components, which can reduce downtime of the wire components simply by replacing them on a unit-by-unit basis as needed. 【Features】 ■ Inorganic (e.g., SiH4) and organic (e.g., CxHy, plastic monomer precursors) materials can be used ■ Integrated gas distribution system ■ Continuous sheet, carrier, or roll-to-roll processes ■ Flexible operating positions: upward (limited), downward (limited), vertical ■ Adjustable wire spacing according to process requirements *For more details, please refer to the PDF document or feel free to contact us.
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basic information
**Merits (Excerpt)** - Split source design with individual wires installed for quick replacement and process restart in a short time. - Work can be performed without removing the vacuum flange from the lid or door. - Wires can be selected for power on or off, helping to extend the production operating time of the film deposition equipment. - Plasma-free process: Low internal stress in the thin film, resulting in smooth and conformal films due to the absence of ion impacts or electrons accelerated by magnetic fields. - Essentially no foreign matter generation. *For more details, please refer to the PDF document or feel free to contact us.*
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【Purpose】 ■Gas Distribution System *For more details, please refer to the PDF document or feel free to contact us.
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Our company is located in Tokyo, where we support VON ARDENNE's sales activities and strategic business development. Additionally, our service engineers support the equipment of Japanese customers. We have installed building material glass coating systems, roll-to-roll web coaters, solar cell sputtering systems, and electron beam systems. Please feel free to contact us if you have any inquiries.