High wear resistance! Introducing a protective film that allows control of surface electrical resistance.
"ASD" is a protective film designed to prevent electrostatic discharge, which is primarily a concern in the semiconductor industry. It can be used in applications such as "E-chucks," "Wafer handlers," and "Wafer stages." Additionally, it has excellent adhesion to substrates. Please feel free to contact us when you need assistance. 【Features】 ■ Control of surface electrical resistance ■ Excellent adhesion to substrates ■ Room temperature film formation ■ Ultra-low friction coefficient ■ High wear resistance * You can download the English version of the catalog. * For more details, please refer to the PDF materials or feel free to contact us.
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【Specifications】 ■Film Thickness: ~10nm ■Electrical Resistance: ~105Ωcm ■Film Formation Temperature: Below 150℃ *You can download the English version of the catalog. *For more details, please refer to the PDF document or feel free to contact us.
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【Applications】 ■E-chucks ■Wafer handler ■Wafer Stages *You can download the English version of the catalog. *For more details, please refer to the PDF materials or feel free to contact us.
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Our development technology has obtained international patents and plays a significant role in society. The super DLC (hydrogen-free ta-C film) produced by the FCVA method is formed through a completely different process compared to DLC films generated by existing PVD and CVD methods. Additionally, there is a composite metal film called "Micc film" that excels in release properties between metals and plastics. Coating films produced by the FCVA method are currently being rapidly adopted in fields such as the hard disk industry, precision machinery industry, and semiconductor industry, and future expansion into the automotive industry, nanoimprint industry, and biomaterials field is anticipated.