"Dust behavior affecting contamination" analysis supported by the rarefied fluid analysis software 'DSMC-Neutrals'.
Simulation Analysis of Dust Behavior Affecting Contamination Initially compatible with various simulations 【Features】 ■ By adopting unstructured meshes, it is possible to compute the exact shape of complex actual devices. ■ High parallel efficiency allows for quick computation results even for large-scale shapes. ■ Since a particle method is used, unlike fluid models, convergence solutions can be obtained even with poor-quality computational grids. ■ With comprehensive technical support, even those new to simulations or busy with experiments can reliably achieve results. ◆ Supports various case studies ◆ - Simulation of rarefied gas flow in a vacuum chamber - Simulation of thin film generation in semiconductor manufacturing - Simulation of thin film generation in semiconductor manufacturing such as Chemical Vapor Deposition (CVD), Organic EL (OLED), and Molecular Beam Epitaxy (MBE) ◆ Outputs various computational results ◆ - Calculation of chemical reactions - Calculation of chemical reactions from Arrhenius-type reaction data - Calculation of dissociation, recombination, and molecular (atomic) exchange reactions - Multiple reaction equations can be set up on the GUI *We also offer contract analysis, so please feel free to contact us.*
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basic information
**Features** - A simulation software for dilute fluid using the particle method, useful for experiments and equipment development involving vacuum chambers. - Capable of simulating film deposition that includes chemical reactions such as CVD. - Adopts unstructured meshes, allowing for calculations that reflect the actual shape of the equipment. - High parallel efficiency enables quick computation results even for large-scale shapes. - Unlike fluid models, the particle method guarantees convergence to a solution even with poor-quality computational grids. - Comprehensive technical support ensures that even those new to simulation or busy with experiments can reliably achieve results. - For other features and details, please contact us.
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Applications/Examples of results
◆ Organic EL (OLED) Simulation * Uniformity of film deposition rate, optimization of shape, temperature dependence of organic material deposition distribution in organic EL simulation, etc. ◆ Molecular Beam Epitaxy (MBE) Simulation * Optimization of molecular beam cell shape, uniformity of deposition distribution, concentration distribution in molecular beam epitaxy simulation, etc. ◆ Showerhead-type CVD (Chemical Vapor Deposition) * Evaluation of film deposition rate * Evaluation of film uniformity * Distribution of radicals affecting film growth in the gas phase * Concentration distribution on the substrate surface * Evaluation of gas flow rate and flow from the showerhead section into the chamber ◆ Vacuum Pump Exhaust Simulation * Temperature and cross-sectional area dependence of conductance, effects of gas accumulation and outgassing, etc. ◆ Behavior of Macroparticles (Dust) * Effects of macroparticles within the chamber, etc. ◆ Hypersonic Rarefied Flow * Density and temperature distribution around objects, effects of chemical reactions, etc. ◆ Shock Waves ◆ Benard Convection ◆ Behavior of dust in the chamber * Effects of dust on films that need to consider gravity.
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Our company develops and sells a "Maintenance Management System" for managing and operating various plants, factories, and other facilities and assets. Currently, this system is undergoing significant evolution into one that incorporates IoT technologies, such as sensor information and input from tablet devices, as well as AI technologies like machine learning, featuring functions for failure prediction and automatic scheduling. Additionally, as part of the recent trend towards digital transformation (DX), there is a growing movement to digitize and automate manufacturing processes and research and development sites in factories to enhance operational efficiency. In line with this trend, our company provides a solution aimed at improving efficiency in research and development environments, known as the Laboratory Information Management System (LIMS), which includes features such as workflow management, data tracking, data management, data analysis, and integration of electronic lab notebooks.
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