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  6. [Case Study] Analysis of DLC Film Formation by Filtered Arc Deposition Method

[Case Study] Analysis of DLC Film Formation by Filtered Arc Deposition Method

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last updated:Dec 04, 2023

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Customization to fit your equipment is also possible! Efficient analysis even for complex models.

"Particle-PLUS" is a simulation software suitable for research, development, and manufacturing of devices, materials, and systems using plasma. It allows for fast results without the need to simulate the entire device by combining axisymmetric models and mirror-symmetric boundary conditions. It supports both 2D (two-dimensional) and 3D (three-dimensional) analyses, enabling efficient analysis even for complex models. 【Features】 ■ Specializes in low-pressure plasma analysis ■ Allows for fast results without the need to simulate the entire device by combining axisymmetric models and mirror-symmetric boundary conditions ■ Excels in plasma simulation for low-pressure gases, which are difficult to compute with fluid models ■ Supports both 2D (two-dimensional) and 3D (three-dimensional) analyses, enabling efficient analysis even for complex models ■ Customization to fit customer devices is possible as a strength of in-house developed software *For more details, please refer to the PDF document or feel free to contact us.

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1.モデル概要.jpg

[Case Study] Analysis of DLC Film Formation by Filtered Arc Deposition Method

1.モデル概要.jpg
1.モデル概要.jpg 2.電子数密度.jpg 3.炭素イオン密度.jpg 4.初期状態_炭素ドロップレット.jpg 5.炭素ドロップレット数密度.jpg
  • Related Link - https://www.wavefront.co.jp/CAE/particle-plus/
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basic information

Various calculation results output ■ Potential distribution ■ Density distribution/temperature distribution/generation distribution of electrons and ions ■ Particle flux and energy flux to the wall ■ Energy spectrum of electrons and ions at the wall ■ Density distribution/temperature distribution/velocity distribution of neutral gas *For more details, please refer to the PDF document or feel free to contact us.

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【Responding to Various Cases】 ■ Magnetron Sputtering ■ PVD, Plasma CVD ■ Capacitive Coupled Plasma (CCP) ■ Dielectric Barrier Discharge (DBD) ■ Electrophoresis *For more details, please refer to the PDF document or feel free to contact us.

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[Case Study] Analysis of DLC Film Formation by Particle-PLUS Filtered Arc Deposition Method

[Case Study] Analysis of DLC Film Formation by Particle-PLUS Filtered Arc Deposition Method

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Our company develops and sells a "Maintenance Management System" for managing and operating various plants, factories, and other facilities and assets. Currently, this system is undergoing significant evolution into one that incorporates IoT technologies, such as sensor information and input from tablet devices, as well as AI technologies like machine learning, featuring functions for failure prediction and automatic scheduling. Additionally, as part of the recent trend towards digital transformation (DX), there is a growing movement to digitize and automate manufacturing processes and research and development sites in factories to enhance operational efficiency. In line with this trend, our company provides a solution aimed at improving efficiency in research and development environments, known as the Laboratory Information Management System (LIMS), which includes features such as workflow management, data tracking, data management, data analysis, and integration of electronic lab notebooks.

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