Stable oscillation from low to high output to meet a wide range of needs for single-sheet cleaning!
The "Fine Jet" is a cleaning unit that allows for the selection of various frequencies. It meets a wide range of needs for single wafer cleaning with stable oscillation from low to high output. It is suitable for various applications such as cleaning wafer substrates, magnetic disks, and post-CMP cleaning of wafers. Additionally, there are various nozzle options available, including chemical resistance and metal contamination-free types. 【Features】 ■ Fine output adjustment: Stable output adjustment in 1W increments (PT-010J50) ■ Selection of various frequencies available (400kHz/1500kHz/3000kHz) ■ Variety of nozzle options: Chemical resistance, metal contamination-free ■ Enhanced detection function: Capable of detecting transducer degradation (PT-010J50) ■ Enhanced communication function: Monitoring of oscillator status and external settings (PT-010J50) *For more details, please download the PDF or feel free to contact us.
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【Other Features】 ■ Standard support for overseas voltages (PT-010J50) ■ Compliance with various standards (FCC, CE, RoHS) *For more details, please download the PDF or feel free to contact us.
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【Applications】 ■ Cleaning of various wafer substrates (silicon, polysilicon, compound semiconductors, quartz glass) ■ Various photomasks ■ Magnetic disks ■ Cleaning of wafers after CMP *For more details, please download the PDF or feel free to contact us.
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Our company develops, designs, manufactures, and sells various equipment tailored to customer applications and manufacturing lines in the semiconductor, photomask, disk, and lens industries. We specialize in customized production based on customer specifications, providing total support for the product lifecycle from design, development, assembly, inspection, installation, to maintenance. By building close relationships with customers at every stage, we can directly sense the issues and technological trends they perceive, allowing us to quickly initiate development in response.
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