Contributing to the world's industrial science through thin film technology.
▼Thin Film Formation Field - Plasma CVD Equipment - Liquid Source CVD Equipment - ALD Equipment ▼Microfabrication Field - Reactive Ion Etching Equipment - ICP Etching - Silicon Deep Etching Equipment - ALE Equipment - XeF2 Etching Equipment ▼Cleaning and Surface Treatment Field - Aqua Plasma Cleaner - Plasma Cleaner - UV Ozone Cleaner
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basic information
Manufacturing and sales of semiconductor and other electronic component manufacturing equipment. CVD equipment, dry etching equipment, dry cleaning equipment, etc.
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Company information
The Kyoto Sangyo 21 Public Interest Incorporated Foundation was established through the integration of the Kyoto Prefecture Small and Medium Enterprise Promotion Corporation, the Kyoto Industrial Information Center, and the Kyoto Industrial Technology Promotion Foundation. We aim to further strengthen our support functions for small and medium enterprises through collaboration between industry, academia, and government, focusing on management innovation, new business development, new industry cultivation, entrepreneurship, and the promotion of IT in companies. By creating a customer-oriented one-stop system, we strive to contribute to the development of business activities of Kyoto companies and the promotion of Kyoto's industry as a comprehensive support organization. Please feel free to contact our foundation when you need assistance.
